cleanroom-metrology-controller

Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry

509 stars

Best use case

cleanroom-metrology-controller is best used when you need a repeatable AI agent workflow instead of a one-off prompt.

Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry

Teams using cleanroom-metrology-controller should expect a more consistent output, faster repeated execution, less prompt rewriting.

When to use this skill

  • You want a reusable workflow that can be run more than once with consistent structure.

When not to use this skill

  • You only need a quick one-off answer and do not need a reusable workflow.
  • You cannot install or maintain the underlying files, dependencies, or repository context.

Installation

Claude Code / Cursor / Codex

$curl -o ~/.claude/skills/cleanroom-metrology-controller/SKILL.md --create-dirs "https://raw.githubusercontent.com/a5c-ai/babysitter/main/library/specializations/domains/science/nanotechnology/skills/cleanroom-metrology-controller/SKILL.md"

Manual Installation

  1. Download SKILL.md from GitHub
  2. Place it in .claude/skills/cleanroom-metrology-controller/SKILL.md inside your project
  3. Restart your AI agent — it will auto-discover the skill

How cleanroom-metrology-controller Compares

Feature / Agentcleanroom-metrology-controllerStandard Approach
Platform SupportNot specifiedLimited / Varies
Context Awareness High Baseline
Installation ComplexityUnknownN/A

Frequently Asked Questions

What does this skill do?

Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry

Where can I find the source code?

You can find the source code on GitHub using the link provided at the top of the page.

SKILL.md Source

# Cleanroom Metrology Controller

## Purpose

The Cleanroom Metrology Controller skill provides comprehensive in-line metrology for nanofabrication process control, enabling precise measurement and monitoring of critical dimensions, film thicknesses, and pattern quality.

## Capabilities

- CD-SEM measurement recipes
- Spectroscopic ellipsometry analysis
- Film thickness mapping
- Surface profilometry
- Defect inspection
- Overlay measurement

## Usage Guidelines

### Metrology Control

1. **CD-SEM Measurements**
   - Develop automated recipes
   - Calibrate against reference
   - Track process variation

2. **Ellipsometry**
   - Select appropriate model
   - Map thickness uniformity
   - Characterize optical constants

3. **Defect Inspection**
   - Set detection thresholds
   - Classify defect types
   - Track yield trends

## Process Integration

- All fabrication processes
- Analysis Pipeline Validation

## Input Schema

```json
{
  "measurement_type": "cd_sem|ellipsometry|profilometry|defect",
  "target_parameter": "string",
  "wafer_map": {"sites": "number", "pattern": "string"},
  "specification": {
    "target": "number",
    "tolerance": "number"
  }
}
```

## Output Schema

```json
{
  "measurements": [{
    "site": "string",
    "value": "number",
    "unit": "string"
  }],
  "statistics": {
    "mean": "number",
    "std_dev": "number",
    "range": "number"
  },
  "uniformity": "number (%)",
  "pass_fail": "boolean",
  "trending_data": {"dates": [], "values": []}
}
```

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