cleanroom-metrology-controller
Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry
Best use case
cleanroom-metrology-controller is best used when you need a repeatable AI agent workflow instead of a one-off prompt.
Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry
Teams using cleanroom-metrology-controller should expect a more consistent output, faster repeated execution, less prompt rewriting.
When to use this skill
- You want a reusable workflow that can be run more than once with consistent structure.
When not to use this skill
- You only need a quick one-off answer and do not need a reusable workflow.
- You cannot install or maintain the underlying files, dependencies, or repository context.
Installation
Claude Code / Cursor / Codex
Manual Installation
- Download SKILL.md from GitHub
- Place it in
.claude/skills/cleanroom-metrology-controller/SKILL.mdinside your project - Restart your AI agent — it will auto-discover the skill
How cleanroom-metrology-controller Compares
| Feature / Agent | cleanroom-metrology-controller | Standard Approach |
|---|---|---|
| Platform Support | Not specified | Limited / Varies |
| Context Awareness | High | Baseline |
| Installation Complexity | Unknown | N/A |
Frequently Asked Questions
What does this skill do?
Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry
Where can I find the source code?
You can find the source code on GitHub using the link provided at the top of the page.
SKILL.md Source
# Cleanroom Metrology Controller
## Purpose
The Cleanroom Metrology Controller skill provides comprehensive in-line metrology for nanofabrication process control, enabling precise measurement and monitoring of critical dimensions, film thicknesses, and pattern quality.
## Capabilities
- CD-SEM measurement recipes
- Spectroscopic ellipsometry analysis
- Film thickness mapping
- Surface profilometry
- Defect inspection
- Overlay measurement
## Usage Guidelines
### Metrology Control
1. **CD-SEM Measurements**
- Develop automated recipes
- Calibrate against reference
- Track process variation
2. **Ellipsometry**
- Select appropriate model
- Map thickness uniformity
- Characterize optical constants
3. **Defect Inspection**
- Set detection thresholds
- Classify defect types
- Track yield trends
## Process Integration
- All fabrication processes
- Analysis Pipeline Validation
## Input Schema
```json
{
"measurement_type": "cd_sem|ellipsometry|profilometry|defect",
"target_parameter": "string",
"wafer_map": {"sites": "number", "pattern": "string"},
"specification": {
"target": "number",
"tolerance": "number"
}
}
```
## Output Schema
```json
{
"measurements": [{
"site": "string",
"value": "number",
"unit": "string"
}],
"statistics": {
"mean": "number",
"std_dev": "number",
"range": "number"
},
"uniformity": "number (%)",
"pass_fail": "boolean",
"trending_data": {"dates": [], "values": []}
}
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