fib-mill-controller

Focused Ion Beam milling skill for site-specific nanofabrication and cross-section preparation

509 stars

Best use case

fib-mill-controller is best used when you need a repeatable AI agent workflow instead of a one-off prompt.

Focused Ion Beam milling skill for site-specific nanofabrication and cross-section preparation

Teams using fib-mill-controller should expect a more consistent output, faster repeated execution, less prompt rewriting.

When to use this skill

  • You want a reusable workflow that can be run more than once with consistent structure.

When not to use this skill

  • You only need a quick one-off answer and do not need a reusable workflow.
  • You cannot install or maintain the underlying files, dependencies, or repository context.

Installation

Claude Code / Cursor / Codex

$curl -o ~/.claude/skills/fib-mill-controller/SKILL.md --create-dirs "https://raw.githubusercontent.com/a5c-ai/babysitter/main/library/specializations/domains/science/nanotechnology/skills/fib-mill-controller/SKILL.md"

Manual Installation

  1. Download SKILL.md from GitHub
  2. Place it in .claude/skills/fib-mill-controller/SKILL.md inside your project
  3. Restart your AI agent — it will auto-discover the skill

How fib-mill-controller Compares

Feature / Agentfib-mill-controllerStandard Approach
Platform SupportNot specifiedLimited / Varies
Context Awareness High Baseline
Installation ComplexityUnknownN/A

Frequently Asked Questions

What does this skill do?

Focused Ion Beam milling skill for site-specific nanofabrication and cross-section preparation

Where can I find the source code?

You can find the source code on GitHub using the link provided at the top of the page.

SKILL.md Source

# FIB Mill Controller

## Purpose

The FIB Mill Controller skill provides focused ion beam process control for site-specific nanofabrication and sample preparation, enabling precise material removal and deposition at the nanoscale.

## Capabilities

- TEM lamella preparation
- Nanoscale milling and deposition
- Pattern writing and editing
- Cross-section imaging
- Gas-assisted etching/deposition
- Damage minimization protocols

## Usage Guidelines

### FIB Processing

1. **TEM Lamella Preparation**
   - Deposit protective cap
   - Rough mill with high current
   - Fine polish to target thickness

2. **Nanofabrication**
   - Define pattern geometry
   - Optimize beam parameters
   - Minimize gallium implantation

3. **Circuit Editing**
   - Navigate to target location
   - Selective material removal
   - Metal deposition for reconnection

## Process Integration

- Nanodevice Integration Process Flow
- Multi-Modal Nanomaterial Characterization Pipeline

## Input Schema

```json
{
  "operation": "lamella|milling|deposition|cross_section",
  "material": "string",
  "target_thickness": "number (nm, for lamella)",
  "pattern_file": "string (for milling)",
  "beam_voltage": "number (kV)"
}
```

## Output Schema

```json
{
  "process_parameters": {
    "beam_current": "number (pA)",
    "dwell_time": "number (us)",
    "overlap": "number (%)"
  },
  "milling_depth": "number (nm)",
  "lamella_thickness": "number (nm)",
  "damage_layer": "number (nm)",
  "processing_time": "number (minutes)"
}
```

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