fib-mill-controller
Focused Ion Beam milling skill for site-specific nanofabrication and cross-section preparation
Best use case
fib-mill-controller is best used when you need a repeatable AI agent workflow instead of a one-off prompt.
Focused Ion Beam milling skill for site-specific nanofabrication and cross-section preparation
Teams using fib-mill-controller should expect a more consistent output, faster repeated execution, less prompt rewriting.
When to use this skill
- You want a reusable workflow that can be run more than once with consistent structure.
When not to use this skill
- You only need a quick one-off answer and do not need a reusable workflow.
- You cannot install or maintain the underlying files, dependencies, or repository context.
Installation
Claude Code / Cursor / Codex
Manual Installation
- Download SKILL.md from GitHub
- Place it in
.claude/skills/fib-mill-controller/SKILL.mdinside your project - Restart your AI agent — it will auto-discover the skill
How fib-mill-controller Compares
| Feature / Agent | fib-mill-controller | Standard Approach |
|---|---|---|
| Platform Support | Not specified | Limited / Varies |
| Context Awareness | High | Baseline |
| Installation Complexity | Unknown | N/A |
Frequently Asked Questions
What does this skill do?
Focused Ion Beam milling skill for site-specific nanofabrication and cross-section preparation
Where can I find the source code?
You can find the source code on GitHub using the link provided at the top of the page.
SKILL.md Source
# FIB Mill Controller
## Purpose
The FIB Mill Controller skill provides focused ion beam process control for site-specific nanofabrication and sample preparation, enabling precise material removal and deposition at the nanoscale.
## Capabilities
- TEM lamella preparation
- Nanoscale milling and deposition
- Pattern writing and editing
- Cross-section imaging
- Gas-assisted etching/deposition
- Damage minimization protocols
## Usage Guidelines
### FIB Processing
1. **TEM Lamella Preparation**
- Deposit protective cap
- Rough mill with high current
- Fine polish to target thickness
2. **Nanofabrication**
- Define pattern geometry
- Optimize beam parameters
- Minimize gallium implantation
3. **Circuit Editing**
- Navigate to target location
- Selective material removal
- Metal deposition for reconnection
## Process Integration
- Nanodevice Integration Process Flow
- Multi-Modal Nanomaterial Characterization Pipeline
## Input Schema
```json
{
"operation": "lamella|milling|deposition|cross_section",
"material": "string",
"target_thickness": "number (nm, for lamella)",
"pattern_file": "string (for milling)",
"beam_voltage": "number (kV)"
}
```
## Output Schema
```json
{
"process_parameters": {
"beam_current": "number (pA)",
"dwell_time": "number (us)",
"overlap": "number (%)"
},
"milling_depth": "number (nm)",
"lamella_thickness": "number (nm)",
"damage_layer": "number (nm)",
"processing_time": "number (minutes)"
}
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